The Photography Master Retreat is a one-of-a-kind, career-enhancing opportunity for established and emerging photographers to engage in artistic introspection and professional critique. It’s not a shooting trip but a rare chance to pause, reflect on your work, and bond with peers who are passionate about photography. It is designed for a select group of 14 artists who have to apply.
The Photography Master Retreat was founded in 2014 as an annual, one-week, immersive workshop in her family home by Martine Fougeron, herself a celebrated photographer and artist, as well as faculty at International Center of Photography, New York. She is one of the three mentors at the retreat. The other two are also renowned in the world of photography, Elisabeth Biondi, Visuals Editor, 1996-2011 at The New Yorker, also an independent curator and writer; Lyle Rexer, a critic and curator – both faculty at the School of Visual Arts, New York.
The Photography Master Retreat 2019 edition will take place July 6-13, 2019 in the south of France, right after the opening week of Les Rencontres d’Arles nearby.
Deadline March 3, 2019.
Apply here: https://bit.ly/2GtfBqx
The Photography Master Retreat
July 06, 2019 to July 13, 2019