This year – for the first time – Foam presents the exhibition Foam Talent in Amsterdam. The show features 20 international artists whose work explores a myriad of subjects and techniques.
Selected through the annual Talent Call – the largest to date, with 1.790 submissions from 75 different countries – the 20 image-makers presented in this exhibition represent a cross section of the current state of photography.
A number of growing trends and tendencies can be clearly perceived in the work of the new Foam Talents. Many featured artists express socio-political concerns in their work. For example by openly denouncing totalitarian regimes in their respective countries, or by commenting on the way in which online imagery feeds a collective fear of terrorism. This year’s selection also includes a striking number of long term projects that acquire greater depth of meaning over time. Equally striking is the embrace of a wide range of media by today’s artists, who rarely confine themselves to the camera alone.
The Talent Issue of Foam Magazine serves as an exhibition catalogue and provides more in-depth texts around the featured artists’ work.
Participating artists:
Sushant Chhabria (India), David De Beyter (France), Mark Dorf (USA), Alinka Echeverría (Mexico/UK), Weronika Gęsicka (Poland), Wang Juyan (China), Thomas Kuijpers (The Netherlands), Quentin Lacombe (France), Clément Lambelet (Switzerland), Namsa Leuba (Switzerland/Guinea), Erik Madigan Heck (USA), Alix Marie (France), Martin Errichiello & Filippo Menichetti (Italy), Wang Nan (China), Kai Oh (South Korea), Viacheslav Poliakov (Ukraine), Ben Schonberger (USA), Sadegh Souri (Iran), Harit Srikhao (Thailand) and Vasantha Yogananthan (France).
Read more at https://www.foam.org
Information
Foam Fotografiemuseum
Keizersgracht 609, Amsterdam, Netherlands
September 01, 2017 to November 12, 2017
